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Subject: Optical swithc fabrication
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Date: 10/04/02 at 8:30 AM
Posted by: MLK
I am trying to solve this problem and need some helps and opinion from those who are gurus in this field as I am new to this subject. Here is the link to the diagram of the opt switch to be designed.
What I am not clear in the figure is, it seems that the cantilever beam is too far below the V groove. What I can figure out is the cantilever beam should be the same level or just a little bit under so that the mirror on the beam will be on the way of optical path. When the beam is actuated, it pulls the mirror out of the optical path. Am I right?
My idea is etch the trench and V groove first with KOH (100 Si will be used) and fabricate the cantilever by surface micromachining process such as depositing sacrificial layer, structural layer etc. Can I fabricate mirror separately and then mount it on the beam? Or Is there a better way?
It would be great if any one could tell me how I can align the pattern mask to the wafer plane.
Thanks in advance.
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